Laser CVD device

Details Laser CVD device Laser CVD device

1986-03-27

1988-02-23

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, C23C 1648

Patent

active

047263202

ABSTRACT:
In a laser CVD device, immediately before being emitted from a nozzle, raw gas in a reaction chamber reacts opto-chemically with a focused laser beam so that it is decomposed to form a radical flow. The radical flow flows against a substrate set in the reaction chamber so that active materials produced by the optochemical decomposition accumulate on the substrate to form a thin film thereon.

REFERENCES:
patent: 4048953 (1977-09-01), Froberg
patent: 4065369 (1977-12-01), Ogawa
patent: 4151034 (1979-04-01), Yamamoto
patent: 4340617 (1982-07-01), Deutsch
patent: 4595570 (1986-06-01), Fukuta
Andreatta, Appl. Phys. Lett., 40(2), Jan. 15, 1982, pp. 183-186.
Boyer, Appl. Phys. Lett., 40(8), Apr. 15, 1982, pp. 716-719.

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