Laser CVD and plasma CVD of CrO.sub.2 films and cobalt doped CrO

Details Laser CVD and plasma CVD of CrO.sub.2 films and cobalt doped CrO Laser CVD and plasma CVD of CrO.sub.2 films and cobalt doped CrO

1989-11-30

1990-12-25

Morgenstern, Norman

Coating processes

Electrical product produced

Welding electrode

427 39, 427 38, 427 541, 4272553, 427128, 427131, 4272557, 427314, B05D 306, B05D 512

Patent

active

049801988

ABSTRACT:
Chromium dioxide is deposited as a ferromagnetic layer onto selected portions of a substrate or over the entire substrate. Chromium hexacarbonyl vapor is introduced into a vacuum deposition chamber at e.g. 10 milliTorr and oxygen is introduced at e.g. 15 to 100 milliTorr. A UV laser beam is focused onto the substrate to form the CrO.sub.2 layer photolytically. The CrO.sub.2 layer can also be deposited by RF plasma deposition. This technique can also be employed for depositing MoC.sub.2, WC.sub.2, Mo.sub.2 .phi..sub.3, MoO.sub.2 or WO.sub.2. Magnetic recording or memory devices are produced without the high failure rate typical of the prior art sputtering technique.

REFERENCES:
patent: 4321073 (1982-03-01), Blair
patent: 4717584 (1988-01-01), Aoki et al.
patent: 4751149 (1988-06-01), Vijayakumar et al.
patent: 4756927 (1988-07-01), Black et al.
patent: 4817557 (1989-04-01), Diem et al.
patent: 4868005 (1980-09-01), Ehrlich et al.
patent: 4925700 (1990-05-01), Brezoczky et al.
Sheward et al., "The Deposition of Molybdenum and Tungsten Coatings on Gun Steel Substrates by a Plasma Assisted CVD Technique", Vacuum, vol. 36 (1-3), 1986, pp. 37-41.

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