Laser crystallization apparatus

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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Details

C355S030000, C355S053000, C359S819000, C359S820000, C430S005000

Reexamination Certificate

active

11193432

ABSTRACT:
A laser crystallization apparatus has a light source, a phase shifter which modulates a laser light from the light source, an illumination system which is provided between the light source and the phase shifter, homogenizes a light intensity of the laser light from the light source and illuminates the phase shifter with the homogenized light, a stage which supports a non-single-crystal semiconductor, an image formation optical system having a plurality of optical members which is provided between the semiconductor on the stage and the phase shifter and forms an image of the modulated laser beam at a desired part on the semiconductor, and a temperature adjustment portion which adjusts a temperature of the optical member by heating or cooling the optical members of the image formation optical system.

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patent: 2004/0161676 (2004-08-01), Taniguchi et al
patent: 2004/0165161 (2004-08-01), Hara
patent: 2004/0218160 (2004-11-01), Hara
patent: 2004/0266080 (2004-12-01), Jyumonji et al.
Masakiyo Matsumura, “Preparation of Ultra-Large Grain Silicon Thin-Films by Excimer-Laser”, Journal of the Surface Science Society of Japan, vol. 21, No. 5, 2000, pp. 278-287.

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