Laser beam irradiating apparatus enabling uniform laser annealin

Details Laser beam irradiating apparatus enabling uniform laser annealin Laser beam irradiating apparatus enabling uniform laser annealin

1993-05-18

1994-10-18

Ben, Loha

Optical: systems and elements

Deflection using a moving element

Using a periodically moving element

359196, 359900, 437174, G02B 2608, H01L 21477

Patent

active

053573650

ABSTRACT:
A laser beam irradiating apparatus is capable of laser annealing with high precision and uniform over the entire surface of a sample. Luminous flux of the laser beam output from a laser source is expanded by a beam expander. The power of the laser beam which has passed through the beam expander is adjusted by a half-wave plate of synthetic quarts and a polarizing prism of synthetic quarts. The laser beam emitted from polarizing prism is guided to a prescribed position by mirrors, and swung in the direction of the X-axis by an X-axis rotation mirror. The laser beam reflected from X-axis rotation mirror has its diameter reduced by a f-.theta. lens to have a prescribed beam spot diameter on the surface of a silicon wafer, and laser beam scanning is carried out at a constant speed. Since half-wave plate and the polarizing prism are formed of synthetic quarts, thermal deformation of optical components caused by continuous irradiation of laser beam can be suppressed, beam profile of the laser beam can be stabilized, therefore highly uniform and highly precise laser annealing becomes possible.

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