Laser beam annealing diffuser

Details Laser beam annealing diffuser Laser beam annealing diffuser

1979-11-21

1981-12-15

Lee, John D.

Electric heating

Microwave heating

Tunnel furnace

219121L, 350 9628, G02B 514

Patent

active

043056407

ABSTRACT:
A laser beam diffuser for use in laser beam annealing comprises a silica laser beam guiding pipe, having a diffusing surface or layer at one end and a polished surface at the other end. The diffusing surface may be a ground surface. A bend or bends removes axial component of speckle produced by the ground surface. Adjacent the polished end the pipe may be of reduced cross section.

REFERENCES:
patent: 3958188 (1976-05-01), Fletcher et al.
patent: 4002896 (1977-01-01), Davies et al.
patent: 4011403 (1977-03-01), Epstein et al.
patent: 4063106 (1977-12-01), Ashkin et al.
patent: 4107628 (1978-08-01), Hill et al.
patent: 4161944 (1979-07-01), Muckerheide
Gat et al., "A Laser-Scanning Apparatus For Annealing . . . ", Appl. Phys. Lett., vol. 32, No. 3, Feb. 1978, pp. 142-144.
Robinson, "Laser Annealing: Processing Semiconductors . . . ", Science, vol. 201, No. 4353, Jul. 1978, pp. 333-335.
Gatet al., "CW Laser Anneal Of Polycrystalline Silicon: . . . ", Appl. Phys. Lett., vol. 33, No. 8, Oct. 1978, pp. 775-778.
Bertolotti et al., "Structure Transitions In Amorphous Silicon . . . ", J. Appl. Phys., vol. 50, No. 1, Jan. 1979, pp. 259-265.

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