Laser beam activated ion source

Radiant energy – Ion generation – Field ionization type

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250423R, H01J 2700

Patent

active

041996852

ABSTRACT:
This invention relates to an apparatus in which laser pulses of up to about one nanosecond duration (.about.10.sup.-9 secs) and high intensity, more than 10.sup.11 watts cm.sup.-2, generate energetic (>>10 keV) ions, which can have very high charge states of more than twenty times the charge state of a single electron, from solid or liquid targets using non-liner, electrodynamic forces operating within the target material. In the present invention the energetic, highly charged ions are produced in such a manner that isotopes of a particular element forming the target can be separated into their respective groups travelling at particular velocities and directions, at distances of more than one meter from the irradiated target. In the present invention, the energetic, highly charged ions are generated and accelerated with high efficiency (>25%) within a relatively cold plasma (<1000 eV) generated from the target material. The energetic, highly charged ions are ejected from the plasma with velocities of more than 10.sup.7 cms sec.sup.-1 thus allowing the separation of mixed isotopes by electric and magnetic fields using techniques well known in the art.

REFERENCES:
patent: 3294970 (1966-12-01), Jenckel
patent: 3406349 (1968-10-01), Swain et al.
patent: 3478204 (1969-11-01), Brubaker et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Laser beam activated ion source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Laser beam activated ion source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Laser beam activated ion source will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1476584

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.