Laser assisted deposition and annealing

Details Laser assisted deposition and annealing Laser assisted deposition and annealing

1980-11-17

1987-10-20

Paschall, M. H.

Electric heating

Metal heating

By arc

219121LS, 219121LE, 219121LF, 427 531, B23K 2600

Patent

active

047015926

ABSTRACT:
Disclosed is an apparatus for depositing a layer of a material on a substrate and annealing the deposited layer, including a Q-switched Nd: YAG laser for providing a coherent light output. An up collimator is situated in the path of the coherent light output to increase the cross sectional area of the output, while a beam divider separates the output into first and second coherent beams. First and second lenses are adjustably positioned in the paths of the beams to focus the first beam on a source of the material and the second beam on the substrate. First and second x-y scanners are provided for scanning the first and second beams. A vacuum chamber includes a connection for a vacuum source and windows to admit the first and second beams into the chamber. A source support positions a source of the material within the chamber in the path of the first beam and a substrate support positions the substrate in the path of the second beam and at least 45.degree. away from the normal to the surface of the source.

REFERENCES:
patent: 4128752 (1978-12-01), Gravel
patent: 4135077 (1979-01-01), Wills
patent: 4146380 (1979-03-01), Caffarella et al.
patent: 4151008 (1979-04-01), Kirkpatrick
patent: 4214015 (1980-07-01), Stephan
patent: 4217374 (1980-08-01), Ovshinsky et al.
patent: 4230515 (1980-10-01), Zajac
patent: 4250009 (1981-02-01), Cuomo et al.
patent: 4281030 (1981-07-01), Silfuast

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