Laser-assisted deposition

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material

Reexamination Certificate

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Details

C438S676000, C430S311000, C257SE21582

Reexamination Certificate

active

11105262

ABSTRACT:
A method is provided for depositing a patterning material onto an optically transparent substrate by the use of a laser beam. A solid layer of a patterning material is placed adjacent to a receiving surface of the substrate. A laser beam is directed at an incident angle between 0 and 90° relative to the receiving surface. The laser beam is transmitted through the substrate and onto the solid layer to cause patterning material from the solid layer to deposit onto the receiving surface of the substrate.

REFERENCES:
patent: 4334139 (1982-06-01), Wittekoek et al.
patent: 6177151 (2001-01-01), Chrisey et al.
patent: 6472030 (2002-10-01), Balkus, Jr. et al.
patent: 2006/0044702 (2006-03-01), Ding et al.

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