Laser apparatus with improved thermal stress resistance

Details Laser apparatus with improved thermal stress resistance Laser apparatus with improved thermal stress resistance

2005-01-18

2005-01-18

Leung, Quyen (Department: 2828)

Coherent light generators

Particular temperature control

Heat sink

Reexamination Certificate

active

06845111

ABSTRACT:
A laser apparatus, comprising a layer fabricated of a lasing medium, the layer having a top surface and a bottom surface, and a first substrate layer fabricated of a laser-inactive material, the first substrate being diffusion-bonded to the layer of lasing medium, wherein the lasing medium comprises a crystalline, polycrystalline or glass material doped with ions. The lasing medium selected for fabrication of the laser apparatus of this invention comprises neodymium-doped yttrium vanadate material and laser-inactive material of the substrate comprises an yttrium-aluminate or yttrium vanadate material. The layers of material are oriented so that the thermal expansion coefficients along the crystallographic axes of the materials match or nearly match.

REFERENCES:
patent: H001673 (1997-08-01), Hanson
patent: 5796766 (1998-08-01), Hargis et al.
patent: 5846638 (1998-12-01), Meissner
patent: 5852622 (1998-12-01), Meissner et al.
patent: 6144484 (2000-11-01), Marshall
patent: 6347109 (2002-02-01), Beach et al.

Affiliated with

Also associated with

Rating

Laser apparatus with improved thermal stress resistance does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Laser apparatus with improved thermal stress resistance, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Laser apparatus with improved thermal stress resistance will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3389055