Laser apparatus, laser irradiation method, semiconductor...

Details Laser apparatus, laser irradiation method, semiconductor... Laser apparatus, laser irradiation method, semiconductor...

2007-06-20

2011-10-25

Maskell, Michael (Department: 2881)

Radiant energy

Irradiation of objects or material

C250S492200, C250S492220, C438S166000, C438S795000, C219S121600, C219S121820, C219S121730

Reexamination Certificate

active

08044372

ABSTRACT:
Continuous wave laser apparatus with enhanced processing efficiency is provided as well as a method of manufacturing a semiconductor device using the laser apparatus. The laser apparatus has: a laser oscillator; a unit for rotating a process object; a unit for moving the center of the rotation along a straight line; and an optical system for processing laser light that is outputted from the laser oscillator to irradiate with the laser light a certain region within the moving range of the process object. The laser apparatus is characterized in that the certain region is on a line extended from the straight line and that the position at which the certain region overlaps the process object is moved by rotating the process object while moving the center of the rotation along the straight line.

REFERENCES:
patent: 3786224 (1974-01-01), Heywang et al.
patent: 4304978 (1981-12-01), Saunders
patent: 4556524 (1985-12-01), Cullis et al.
patent: 4689467 (1987-08-01), Inoue
patent: 4910549 (1990-03-01), Sugita
patent: 5010230 (1991-04-01), Uemura
patent: 5111021 (1992-05-01), Jolys et al.
patent: 5138131 (1992-08-01), Nishikawa et al.
patent: 5227607 (1993-07-01), Ishiyama
patent: 5309925 (1994-05-01), Policastro
patent: 5372836 (1994-12-01), Imahashi et al.
patent: 5429730 (1995-07-01), Nakamura et al.
patent: 5525807 (1996-06-01), Hirokawa et al.
patent: 5571430 (1996-11-01), Kawasaki et al.
patent: 5608223 (1997-03-01), Hirokawa et al.
patent: 5756364 (1998-05-01), Tanaka et al.
patent: 5795795 (1998-08-01), Kousai et al.
patent: RE36113 (1999-02-01), Brueck et al.
patent: 5872365 (1999-02-01), Goh et al.
patent: 5903324 (1999-05-01), Lyons et al.
patent: 5948288 (1999-09-01), Treves et al.
patent: 6027960 (2000-02-01), Kusumoto et al.
patent: 6071796 (2000-06-01), Voutsas
patent: 6096581 (2000-08-01), Zhang et al.
patent: 6160615 (2000-12-01), Matsui et al.
patent: 6204519 (2001-03-01), Yamazaki et al.
patent: 6270619 (2001-08-01), Suzuki et al.
patent: 6300176 (2001-10-01), Zhang et al.
patent: 6458635 (2002-10-01), Yamazaki et al.
patent: 6509212 (2003-01-01), Zhang et al.
patent: 6580053 (2003-06-01), Voutsas
patent: 6582996 (2003-06-01), Hara et al.
patent: 6700096 (2004-03-01), Yamazaki et al.
patent: 6723590 (2004-04-01), Zhang et al.
patent: 6744008 (2004-06-01), Kasahara et al.
patent: 6844523 (2005-01-01), Yamazaki et al.
patent: 6927419 (2005-08-01), Hara et al.
patent: 2002/0009839 (2002-01-01), Zhang et al.
patent: 2002/0031876 (2002-03-01), Hara et al.
patent: 2002/0058366 (2002-05-01), Miyasaki et al.
patent: 2002/0094008 (2002-07-01), Tanaka
patent: 2003/0015716 (2003-01-01), Valliath
patent: 2003/0059991 (2003-03-01), Teramoto et al.
patent: 2003/0080100 (2003-05-01), Yamazaki et al.
patent: 2003/0127435 (2003-07-01), Voutsas
patent: 2004/0198072 (2004-10-01), Zhang et al.
patent: 2007/0117288 (2007-05-01), Miyairi
patent: 55-150238 (1980-11-01), None
patent: 55150238 (1980-11-01), None
patent: 61-080814 (1986-04-01), None
patent: 61-179524 (1986-08-01), None
patent: 63-005514 (1988-01-01), None
patent: 64-082636 (1989-03-01), None
patent: 05-275336 (1993-10-01), None
patent: 07-335585 (1995-12-01), None
patent: 2003-332258 (2003-11-01), None
patent: 2003332258 (2003-11-01), None

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