Laser apparatus, laser irradiation method, manufacturing...

Electric heating – Metal heating – By arc

Reexamination Certificate

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C219S121660, C219S121670, C219S121680, C219S121690, C219S121820, C219S121850

Reexamination Certificate

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06844523

ABSTRACT:
To provide a continuous oscillation laser apparatus, and a manufacturing method of a semiconductor device using the continuous oscillation laser apparatus, which can enhance processing efficiency. A laser apparatus according to the present invention includes: a laser oscillation apparatus; a unit for rotating an object to be processed; a unit for moving the object to be processed toward a center of the rotation or toward an outside from the center; and an optical system for processing a laser light outputted from the laser oscillation apparatus and irradiating the processed laser light to a definite region in a moving range of the object to be processed, in which, while the object to be processed is rotated, the object to be processed is moved toward the center of the rotation or toward the outside from the center to move a position where the definite region and the object to be processed overlap.

REFERENCES:
patent: 5010230 (1991-04-01), Uemura
patent: 5138131 (1992-08-01), Nishikawa et al.
patent: 5227607 (1993-07-01), Ishiyama
patent: 5372836 (1994-12-01), Imahashi et al.
patent: 5571430 (1996-11-01), Kawasaki et al.
patent: 6700096 (2004-03-01), Yamazaki et al.
patent: 20020094008 (2002-07-01), Tanaka
patent: 05-275336 (1993-10-01), None
U.S. application Ser. No. 10/237,172, filed Sep. 9, 2002, (Specification, Claims and Drawings).

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