Laser apparatus, exposure apparatus and method

Details Laser apparatus, exposure apparatus and method Laser apparatus, exposure apparatus and method

2006-08-01

2006-08-01

Harvey, Minsun Oh (Department: 2828)

Coherent light generators

Particular active media

Gas

C372S056000, C372S057000, C372S058000, C372S059000

Reexamination Certificate

active

07085302

ABSTRACT:
There is to provide a laser apparatus that emits a laser beam by exciting gas enclosed in a chamber, including a gas characteristic detecting mechanism for detecting a characteristic of the gas in the chamber, and a calculation mechanism for calculating an oscillation wavelength and/or a wavelength spectral bandwidth of the laser beam based on a detected result by the gas characteristic detecting mechanism.

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An Office action from the Chinese Patent Office dated Oct. 29, 2004 for Appl. No. 03103270.
English translation of the above Chinese Office action dated Oct. 29, 2004 for Appl. No. 031030270.

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