Laser annealed dielectric for dual dielectric capacitor

Details Laser annealed dielectric for dual dielectric capacitor Laser annealed dielectric for dual dielectric capacitor

1982-12-17

1984-03-13

Griffin, Donald A.

Electricity: electrical systems and devices

Electrostatic capacitors

Fixed capacitor

29 2542, 148 15, H01G 3075, H01G 700, H01L 2126

Patent

active

044371390

ABSTRACT:
A thin film capacitor having a high dielectric constant and low leakage current includes a dual dielectric structure. The dual dielectric comprises a leakage current blocking first dielectric layer and a high dielectric constant second dielectric layer. The high dielectric constant second dielectric layer is formed by laser annealing a ferroelectric forming titanate or zirconate into a ferroelectric. A leakage current blocking first dielectric layer may also serve as an antireflective coating for the titanate or zirconate layer so that better coupling of the laser energy to the titanate or zirconate layer is obtained.

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J. Appl. Phys. 52(8), 8/81, "Laser Annealing to Produce Ferroelectric-Phase PbTiO.sub.3 Thin Films," Y. Matsui, pp. 5107-5111.
Semiconductors & Semimetals, vol. II, Solar Cells, "Antireflective Coatings," 1975 Academic Press, H. J. Hovel, pp. 203-207.
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IBM Technical Disclosure Bulletin, vol. 22, No. 12, May 1980, "Selective Laser Annealing Through Quarter- and Half-Wave Coatings," A. B. Fowler and R. T. Hodgson, pp. 5473-5474.

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