Laser and laser-assisted free electron beam deposition apparatus

Details Laser and laser-assisted free electron beam deposition apparatus Laser and laser-assisted free electron beam deposition apparatus

1996-07-22

1998-12-15

Bueker, Richard

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of coating supply or source outside of primary...

427596, 118723EB, 118726, C23C 1400

Patent

active

058493719

ABSTRACT:
A laser and laser-assisted multi-beam deposition apparatus for evaporating and/or sublimating a material to deposit on a substrate comprises using a laser and an electron beam, or two lasers, simultaneously applied to the material to vaporize the material with reduced ejection of material particulates and reduced oxidation of the material. The apparatus and method is particularly useful in the processing of blanket refractory metal depositions on large flat panel display substrates, silicon wafer substrates, and tribological/ceramic coatings.

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patent: 5302208 (1994-04-01), Grimm
patent: 5316585 (1994-05-01), Okamoto
patent: 5478398 (1995-12-01), Nakanishi

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