Laser ablation process for preparing oxide superconducting thin

Details Laser ablation process for preparing oxide superconducting thin Laser ablation process for preparing oxide superconducting thin

1992-06-12

1994-07-19

King, Roy V

Superconductor technology: apparatus, material, process

Processes of producing or treating high temperature...

Coating

505730, 505732, 427596, 427 62, 4271263, 427314, B05D 306, H01L 3924

Patent

active

053309685

ABSTRACT:
A laser ablation process for preparing an oxide superconducting thin film characterized in that an electrode is arranged between a substrate and a target. While the film is formed by laser ablation, a bias voltage of 75-100 V is applied between the electrode and the target.

REFERENCES:
Singh et al., "Effect of processing geometry in oxygen incorporation and in situ formation of YBa.sub.2 Cu.sub.3 O.sub.7 superconducting thin films by pulsed laser evaporation technique", Appl. Phys. Lett. 55(22) Nov. 1989, pp. 2351-2353.
Journal of Applied Physics, vol. 68, No. 3, Aug. 1, 1990, New York pp. 1403-1406, D. S. Misra et al., "Growth of as-deposited superconducting thin films of Y.sub.1 Ba.sub.2 Cu.sub.3 O.sub.7-d using Nd:YAG laser".
Applied Physics Letters, vol. 59, No. 27, dated Dec. 20, 1991, New York pp. 3643-3645, H. S. Kowk et al., "Plasma-assisted laser deposition of YBa.sub.2 Cu.sub.3 O.sub.7-d ".
Patent Abstracts of Japan, vol. 15, No. 324 (C-859) Aug. 19, 1991 and JP-A-31 22 272.
Patent Abstract of Japan, vol. 15, No. 445 (C-884) Nov. 12, 1991 and JP-A-31 91 054 (Sanyo Electric Co. Ltd.).

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