Laser ablation mask repair method

Details Laser ablation mask repair method Laser ablation mask repair method

1994-03-30

1995-08-15

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430297, 430945, 216 12, 216 26, 216 65, 216 66, 264 137, 65 28, G03F 900

Patent

active

054418364

ABSTRACT:
A laser ablation mask repair method. Defects (holes) are located in a dielectric mask. The surface of the mask above the defect is melted with a CO.sub.2 laser to form a depression in the surface. The depression forms a lens which diffuses ablation laser energy instead of transmitting it. Thus, the ablation laser is prevented from ablating a polymer ablation layer, because the holes are blocked and, the mask is repaired. The method may also be used to make Engineering Changes (EC) laser ablation masks.

REFERENCES:
patent: 4340654 (1982-07-01), Campi
patent: 4414059 (1983-11-01), Blum et al.
patent: 4463073 (1984-07-01), Miyauchi et al.
patent: 4508749 (1985-04-01), Brannon et al.
patent: 4851097 (1989-07-01), Hattori et al.
patent: 4923772 (1990-05-01), Kirch et al.
patent: 5085957 (1992-02-01), Hosono

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