Laser

Details Laser Laser

1981-03-03

1983-11-22

Davie, James W.

Coherent light generators

Particular pumping means

Electrical

372 97, 372 86, H01S 3097

Patent

active

044173423

ABSTRACT:
A gas laser includes a pair of subsidiary electrodes to form a sharpening gap. These subsidiary electrodes are located within the envelope of the laser so as to be exposed to the same gas or mixture of gases that flow between the main electrodes and support the main lasing action. The efficiency of the laser and the lifetime of the electrodes of the sharpening gap are thereby improved, together with other advantages.

REFERENCES:
patent: 4207540 (1980-06-01), Ernst
"Injection Locking of a Xenon Fluoride Laser", Goldhar et al., App. Phys. Lett., vol. 31, No. 10, Nov. 15, 1977.
"High-Energy Subnanosecond Pulse Amplification in XeCl", Pacala et al., App. Phys. Lett., vol. 37, No. 4, Aug. 15, 1980.
"Operating and Beam Characteristics, Including Spectral Narrowing, of a TEA Rare-Gas Halide Excimer Laser", McKee; IEEE Jour. Quant. Elecs., vol. 15, No. 5; 1979.
"Necessary Conditions for the Homogeneous Formation of Pulsed Avalanche Discharges at High Gas Pressures", Levatter et al.; Jour. App. Phys., vol. 51, No. 1, 1980.
"A Scalable Multiatmosphere High-Power XeF Laser", Sargeant et al.; App. Phys. Lett., vol. 30, No. 12, Jun. 15, 1977.
"Spatially Resolved Gain Measurements in UV Preionized Homogeneous Discharge XeCl and KRF Lasers", Watanabe et al.; App. Phys. Lett., vol. 38, No. 1, Jan. 1, 1981.
"Resistive Stabilisation of a Discharge-Excited XeCl Laser", Hogan et al.; Jour. of Phys. D: App. Phys., vol. 13, 1980.

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