1973-10-25
1976-06-08
Larkins, William D.
357 51, 357 55, 357 60, H01L 2993
Patent
active
039627136
ABSTRACT:
Disclosed is a semiconductor capacitor which utilizes the volume of the semiconductor substrate in which it is formed to create increased surface area and thereby to provide increased capacitance. The surface area is increased by forming selectively spaced grooves in the surface of the semiconductor substrate and utilizing the sidewalls of the grooves as surface. A thin layer of dielectric is formed over the increased surface area, and thereafter a metal layer is formed over the dielectric layer to provide a dielectric capacitor. An active junction P-N capacitor may be formed instead of a dielectric capacitor by forming a P-N junction comprising the increased surface area, and thereover forming the metallized contact.
REFERENCES:
patent: 2841508 (1958-07-01), Roup et al.
patent: 3278337 (1966-10-01), Gault
patent: 3506888 (1970-04-01), Siebertz et al.
patent: 3579057 (1971-05-01), Stoller
patent: 3586929 (1971-06-01), Burmeister et al.
patent: 3611062 (1971-10-01), Rideout
Kendall Don L.
Matzen Walter T.
Comfort James T.
Honeycutt Gary C.
Larkins William D.
Levine Harold
Texas Instruments Incorporated
LandOfFree
Large value capacitor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Large value capacitor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Large value capacitor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1103744