Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1991-10-25
1993-04-20
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429809, 20429812, C23C 1434
Patent
active
052039803
ABSTRACT:
A large surface cathode arrangement with a consumable cathode plate that is connected via an intermediate plate with high electrical and thermal conductivity to a base plate is provided. The arrangement is provided with cooling channels. Current supply conduits and current supply locations for uniformly distributing the electrical current density and the electrical potential within the cathode plate are furthermore provided which allow the consumption of the cathode plate to become more uniform. Preferably, three or more current supply conduits are connected to a plurality of current supply locations that are uniformly distributed over the base plate. The cooling channels are provided at the face of the intermediate plate which is facing the base plate so that a continuous wall of the intermediate plate is in contact with the cathode plate, thus contributing to the improvement of the current distribution. The cathode arrangement is especially suitable for coating apparatus according to the PVD principle.
REFERENCES:
patent: 3945911 (1976-03-01), McKelvey
Cremer Dieter
Dederichs Hans-Gerhard
Multi-Arc Oberflachentechnik GmbH
Weisstuch Aaron
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