Large-sized substrate and method of producing the same

Details Large-sized substrate and method of producing the same Large-sized substrate and method of producing the same

2007-03-20

2007-03-20

Hug, Eric (Department: 1731)

Glass manufacturing

Processes

With measuring, sensing, inspecting, indicating, or testing

C065S065000

Reexamination Certificate

active

10355154

ABSTRACT:
A large-sized substrate having a diagonal length of not less than 500 mm and a ratio of flatness/diagonal length of not more than 6.0×10−6is disclosed. By use of the large-sized substrate for exposure of the present invention, the exposure accuracy, particularly the register accuracy and resolution are enhanced, so that it is possible to achieve high-precision exposure of a large-sized panel. With the processing method according to the present invention, it is possible to stably obtain a large-sized photomask substrate with a high flatness, and since the CD accuracy (dimensional accuracy) at the time of exposure of the panel is enhanced, it is possible to perform exposure of a fine pattern, leading to a higher yield of the panel. Furthermore, by applying the processing method according to the present invention, it is also possible to create an arbitrary surface shape.

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