Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-11-23
2009-02-10
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07488560
ABSTRACT:
A pellicle is provided that comprises a pellicle frame that has an upper end face and a lower end face and is a quadrilateral having a side greater than 30 cm or a circle having a diameter of greater than 30 cm, a pellicle film stretched over the upper end face of the pellicle frame, and a pressure-sensitive adhesion layer for affixing an exposure master plate to the pellicle frame, the pressure-sensitive adhesion layer being provided on the lower end face of the pellicle frame, the pressure-sensitive adhesion layer having a thickness of 400 μm or greater, and the pressure-sensitive adhesion layer having a level of cohesive breaking strength such that the pressure-sensitive adhesion layer does not undergo cohesive failure when peeled off from the pellicle frame or the exposure master plate.
REFERENCES:
patent: 4861402 (1989-08-01), Gordon
patent: 5378514 (1995-01-01), Hamada et al.
patent: 5834143 (1998-11-01), Matsuoka et al.
patent: 7067222 (2006-06-01), Nagata
patent: 63-27707 (1985-05-01), None
patent: 9-54424 (1997-02-01), None
Kratz Quintos & Hanson, LLP
Rosasco Stephen
Shin-Etsu Chemical Co. , Ltd.
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