Large NA projection lens system with aplanatic lens element for

Optical: systems and elements – Lens – Multiple component lenses

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

359649, G02B 964

Patent

active

059868244

ABSTRACT:
Projection lens systems for transferring a pattern on a reticle onto a wafer having an aplanatic lens element. The aplanatic lens element has a shape factor between 0.1 and 0.224, the projection lens system satisfies the condition:

REFERENCES:
patent: 4770477 (1988-09-01), Shafer
patent: 4812028 (1989-03-01), Matsumoto
patent: 4891663 (1990-01-01), Hirose
patent: 4948238 (1990-08-01), Araki
patent: 4964704 (1990-10-01), Shinohara
patent: 5142409 (1992-08-01), Hanzawa et al.
patent: 5260832 (1993-11-01), Togino et al.
patent: 5323263 (1994-06-01), Schoenmakers
patent: 5448408 (1995-09-01), Togino et al.
patent: 5519537 (1996-05-01), Shikama
patent: 5555479 (1996-09-01), Nakagiri
patent: 5636000 (1997-06-01), Ushida et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Large NA projection lens system with aplanatic lens element for does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Large NA projection lens system with aplanatic lens element for , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Large NA projection lens system with aplanatic lens element for will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1331715

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.