Large NA projection lens for excimer laser lithographic systems

Details Large NA projection lens for excimer laser lithographic systems Large NA projection lens for excimer laser lithographic systems

1998-06-30

1999-10-19

Metjahic, Safet

Photocopying

Projection printing and copying cameras

Illumination systems or details

359774, G03B 2754, G02B 934

Patent

active

059698039

ABSTRACT:
An apparatus and method for transferring a pattern on a reticle onto a wafer includes a projection lens system having four groups of lens elements. The projection lens system satisfies the conditions: 0.3<.vertline.f.sub.G2 /L.vertline.<4.46, 1.8<.vertline.f.sub.G3 /L.vertline.<4.8, 0.05<.vertline.f.sub.G2 /f.sub.G3 .vertline.<0.25, 0.77<.vertline.f.sub.G1 /f.sub.G4 .vertline.<1.1, 0.17<f.sub.G4 /F<0.195, 0.14<f.sub.G1 /F<0.191, and having a numerical aperture equal to or greater than 0.60.

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