Large die photolithography

Details Large die photolithography Large die photolithography

1992-12-16

1998-01-06

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 430321, G03F 900

Patent

active

057052999

ABSTRACT:
An improved reticle (20) and method of using it to expose layers of wafers for large integrated circuits (10). The integrated circuit (10) is designed so that nonrepeating patterns are laid out in perimeter areas, distinct from the center area containing contiguous repeating patterns. The reticle (20) is patterned with multiple masks (21-23), with different masks representing the repeating and nonrepeating patterns. The mask (22) representing the repeating pattern may then be stepped and illuminated separately from any mask (21, 23) representing a nonrepeating pattern.

REFERENCES:
patent: 4869998 (1989-09-01), Eccles et al.
patent: 5227269 (1993-07-01), Scott
Holbrook, et al. "Microlithography for Large Area Flat Panel Display Substrates," Solid State Technology, May 1992, vol. 35, No. 5.

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