Radiant energy – Irradiation of objects or material – Ion or electron beam irradiation
Patent
1988-11-14
1991-03-26
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Ion or electron beam irradiation
2504922, 250423F, 250427, 3133621, 31511131, 31511181, H01J 724
Patent
active
050031783
ABSTRACT:
A large-area electron source which can operate continuously, stably, and indefinitely in a poor vacuum environment. The source includes a glow discharge cathode, appropriately positioned with respect to a target anode, and a fine-mesh grid spaced from the cathode by a distance less than the mean free path length of electrons leaving the cathode, the grid being electrically biased to control the electron beam current over a wide range with only small grid voltage changes. An accelerating voltage applied to the cathode can be varied continuously from as low as a few hundred volts to 30 KeV or greater and the source will continue to operate satisfactorily. Further, the grid is made of a fine mesh wire of sufficiently small dimensions as to not be resolvable in the target plane. A further refinement of the device utilizes scanning coils to achieve additional uniformity of the incident beam at the target plane. The basic apparatus of the invention can be combined with other features, for use in shadow mask lithography, resist sensitivity measurement, lift off processing, and resist curing.
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Warren J. Ramler, "Performance Characteristics of a WIP Electron Beam System", presented at RadTech'88-North America Conf., Apr. 24-28, 1988.
Berman Jack I.
Electron Vision Corporation
Heal Noel F.
Nguyen Kiet T.
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