Large-area projection exposure system

Photocopying – Projection printing and copying cameras – Step and repeat

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

G03B 2742

Patent

active

055305164

ABSTRACT:
Scanning microlithography apparatus for effecting exposures of substrates to radiation sources. A mask support and a substrate stage are disposed in spaced-apart positions directly opposite each other, witch a lens system between them and with a radiation source on the outer side of the mask support. The mask support and substrate stage are at a substantial angle to horizontal in order to achieve benefits including reduction in gravitation-induced sagging of the mask. A massive block of granite is provided at the substantial angle to horizontal, and has a flat face that keeps the mask support and substrate stage at desired positions relative to the radiation source and lens system, during scanning.

REFERENCES:
patent: 3494695 (1970-02-01), Sollima et al.
patent: 3819865 (1974-06-01), Feldman et al.
patent: 3884573 (1975-05-01), Franklin
patent: 4011011 (1977-03-01), Hemstreet et al.
patent: 4068947 (1978-01-01), Buckley et al.
patent: 4391494 (1983-07-01), Hershel
patent: 4737823 (1988-04-01), Bouwer et al.
patent: 4748477 (1988-05-01), Isohata et al.
patent: 4749867 (1988-06-01), Matsushita et al.
patent: 4880309 (1989-11-01), Wanta
patent: 4881231 (1989-11-01), Jain
patent: 4924257 (1990-05-01), Jain
patent: 5266790 (1993-11-01), Markle et al.
patent: 5285236 (1994-02-01), Jain
patent: 5291240 (1994-03-01), Jain
patent: 5298939 (1994-03-01), Swanson et al.
patent: 5446519 (1995-08-01), Makinouchi
Douglas S. Goodman of IBM, T. J. Watson Research Center, Yorktown Heights, New York; "Scanning Excimer Ablation System"; Optical Society of America Annual Meeting in San Jose, California, Nov. 6, 1991.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Large-area projection exposure system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Large-area projection exposure system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Large-area projection exposure system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2193463

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.