Coating apparatus – Gas or vapor deposition – With treating means
Reissue Patent
2008-04-01
2008-04-01
Lund, Jeffrie R (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S7230AN, C118S7230ER, C156S345480
Reissue Patent
active
RE040195
ABSTRACT:
A chamber housing (2) enclosing a plasma region (20) in a large area plasma source used for performing plasma assisted processes in large area substrates, the chamber housing (2) being composed of: a housing member (2) constituting a substantially vertically extending wall (4) surrounding a space (6) corresponding to the plasma region (10), the housing member (2) having a plurality of openings (32) and electrically conductive elements forming an electrostatic shield around the space; a plurality of dielectric members (36) each having a peripheral edge and each disposed to close a respective opening (23); and sealing members (40, 40′, 42′) forming a hermetic seal between said housing member and said peripheral edge of each of said dielectric members (36).
REFERENCES:
patent: 3864960 (1975-02-01), Fletcher et al.
patent: 4277939 (1981-07-01), Hyman, Jr.
patent: 5051659 (1991-09-01), Uhm et al.
patent: 5234529 (1993-08-01), Johnson
patent: 5525159 (1996-06-01), Hama et al.
patent: 5653811 (1997-08-01), Chan
patent: 5685941 (1997-11-01), Forster et al.
patent: 5874014 (1999-02-01), Robson et al.
patent: 5883016 (1999-03-01), Chan et al.
patent: 5903106 (1999-05-01), Young et al.
patent: 5990775 (1999-11-01), Inui et al.
patent: 6330822 (2001-12-01), Hawk et al.
patent: 6375750 (2002-04-01), van Os et al.
patent: 6530342 (2003-03-01), Johnson
patent: 6630364 (2003-10-01), Johnson
patent: 6758948 (2004-07-01), Johnson
patent: 6811611 (2004-11-01), Johnson
patent: 6846363 (2005-01-01), Kazumi et al.
patent: RE39020 (2006-03-01), Hama et al.
patent: WO 99/26267 (1999-05-01), None
Lund Jeffrie R
Tokyo Electron Limited
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