Large-area mask and exposure system having the same

Details Large-area mask and exposure system having the same Large-area mask and exposure system having the same

2005-08-02

2005-08-02

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C430S005000

Reexamination Certificate

active

06924880

ABSTRACT:
Provided are a large-area mask and an exposure system having the same. The mask includes a transparent substrate, which includes a light transmission region and a light-blocking region, and a plurality of bars, which is arranged on the substrate to support the substrate. When the large-area mask is installed on the exposure system, the bars can support the mask, thus preventing downward level shifting of the mask.

REFERENCES:
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patent: 4804600 (1989-02-01), Kato et al.
patent: 5260151 (1993-11-01), Berger et al.
patent: 6204509 (2001-03-01), Yahiro et al.
patent: 6403268 (2002-06-01), Kawata
patent: 6428937 (2002-08-01), Katakura
patent: 6534222 (2003-03-01), Suzuki
patent: 6562521 (2003-05-01), Nistler et al.
patent: 2001/0016292 (2001-08-01), Kobinata et al.

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