Lapping plate topography system

Details Lapping plate topography system Lapping plate topography system

2005-04-19

2005-04-19

Wachsman, Hal (Department: 2857)

Data processing: measuring, calibrating, or testing

Measurement system

Dimensional determination

C702S167000, C702S157000, C702S166000

Reexamination Certificate

active

06882956

ABSTRACT:
A lapping plate topography system includes a measuring apparatus for measuring the surface of a lapping plate, and an analysis apparatus for analyzing and presenting the data resulting from such measurements. The measurement apparatus has a non-contacting capacitive probe for measuring a height of the surface of the lapping plate, a rotary arm assembly for moving the probe in an arc over the surface of the lapping plate, and a spindle assembly for rotating the lapping plate about its center. The computer-based analysis apparatus is operable to input from the measurement apparatus the measured height at a plurality of data points on the surface of the lapping plate, calculate Fourier transform harmonic coefficients based on the plurality of measured heights, calculate surface ripple coefficients based on the calculated Fourier transform harmonic coefficients, and output the calculated surface ripple coefficients to an appropriate display device.

REFERENCES:
patent: 5749769 (1998-05-01), Church et al.
patent: 5948468 (1999-09-01), Sweatt et al.
patent: 6587794 (2003-07-01), Maznev
IBM Lapping Plate Topographer Manual, pp. 1-29, Apr. 1992.

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