Lanthanide/phosphorus precursor compositions for MOCVD of lantha

Details Lanthanide/phosphorus precursor compositions for MOCVD of lantha Lanthanide/phosphorus precursor compositions for MOCVD of lantha

1996-08-14

1997-12-16

Brunsman, David

Compositions: coating or plastic

Coating or plastic compositions

Heavy metal compound containing

556 19, 556 21, 556 22, 556 24, 427226, 4272481, 427255, 4272553, C23C 1600, C07F 500

Patent

active

056980221

ABSTRACT:
A precursor composition useful for vapor deposition formation of lanthanide metal/phosphorus oxide films, comprising a precursor compound selected from the group consisting of: (i) adducts of the formula MA.sub.3 (L).sub.x ; (ii) phosphido complexes of the formulae M(PR.sub.3).sub.3 or M(PR.sub.3).sub.3 L.sub.x ; and (iii) disubstituted phosphate complexes of the formulae A.sub.2 M(O.sub.2 P(OR).sub.2), AM(O.sub.2 P(OR).sub.2).sub.2, and M(O.sub.2 P(OR).sub.2).sub.3, wherein: x is from 1 to 5, A=Cp or .beta.-diketonate, Cp=cyclopentadienyl, methylcyclopentadienyl, or TMS-cyclopentadienyl, R=C.sub.1 -C.sub.8 alkyl, and L=a phosphorus-containing ligand selected from the group consisting of phosphine, phosphine oxide, phosphite, phosphate, and 1,2-bis(dimethoxyphosphoryl)benzene, subject to the provisos that: when x is 2 or greater, each L may be the same as or different from the other L; and when the precursor compound is a .beta.-diketonate compound of formula (i), L is not phosphate or phosphine oxide. The precursor composition may be employed for forming a lanthanide metal/phosphorus oxide film on a substrate, by depositing a lanthanide metal/phosphorus material on the substrate from the lanthanide metal/phosphorus precursor composition in vaporized form, and incorporating oxygen in the lanthanide metal/phosphorus material to form the lanthanide metal/phosphorus oxide film on the substrate.

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Deschanvres, J.L.; Vaca, J. M.; Joubert, J. C. "Thin Films of Zirconia-Phosphate Glasses Deposited by an Aerosol CVD Process." in J. Phys. IV (1995) 5, C5/1029.

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