Langmuir probe system for radio frequency excited plasma process

Details Langmuir probe system for radio frequency excited plasma process Langmuir probe system for radio frequency excited plasma process

1992-09-29

1994-08-16

Wieder, Kenneth A.

Electricity: measuring and testing

Impedance, admittance or other quantities representative of...

Lumped type parameters

324754, 20419233, 20429832, 31511121, C23C 1400

Patent

active

053390393

ABSTRACT:
A Langmuir probe system for measuring plasma internal discharge parameters in a radio frequency excited plasma processing system includes an electrically tuned resonant circuit. The electrically tuned resonant circuit includes a semiconductor variable capacitor. Specifically, an inductor and FET are connected in parallel to form a resonant circuit used to electrically tune the Langmuir probe. The tuning circuit is placed within a moveable, electrically floating, probe housing and is electrically tuned to improve tuning accuracy and to reduce detuning during operation.

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patent: 5122251 (1992-06-01), Campbell et al.
patent: 5167748 (1992-12-01), Hall
Capacitive Probes for rf Process Plasmas, S. E. Savas et al., Rev. Sci. Irum. 60 (11), Nov., 1989, pp. 3391-3395.
A Tuned Langmuir Probe for Measurements in RF Glow Discharges, A. P. Paranipe, J. Appl. Phys. 67(11), Jun. 1990, pp. 6718-6727.
Use of Electric Probes in Silane Radio Frequency Discharges, E. R. Mosburg, Jr. et al., J. Appl. Phys. 54(9), Sep. 1983, pp. 4916-4927.
Langmuir Probe Characteristics in RF Glow Discharges, N. Hershkowitz et al., Plasma Chemistry and Plasma Processing, vol. 8, No. 1, Dec. 1988, pp. 35-52.
Pressure Dependence of Electron Temperature Using RF-Floated Electrostatic Probes in RF Plasmas*, Applied Physics Letters, vol. 30, No. 7, Apr., 1977, pp. 316-319, Cantin et al.
Floating Probe Methods, J. D. Swift et al., Electrical Probes for Plasma Diagnostics, Dec. 1971, pp. 137-151.

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