Lamp annealer and method for annealing semiconductor wafer

Details Lamp annealer and method for annealing semiconductor wafer Lamp annealer and method for annealing semiconductor wafer

1999-03-29

2000-09-19

Walberg, Teresa

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

392416, 118724, 118725, F27B 514

Patent

active

061215805

ABSTRACT:
A lamp annealer for heating and annealing product wafers loaded into a chamber by a lamp means. The lamp annealer comprises a first chamber for loading product wafers, a second chamber disposed adjacent to the first chamber for loading only a dummy wafer, a pyrometer means for measuring a temperature of a wafer in the first chamber and a temperature of a wafer in the second chamber, and a lamp means for heating the wafer in the first chamber and the wafer in the second chamber. Periodically, dummy wafers are loaded into the first and second chambers, temperatures of the dummy wafer in the first chamber and the dummy wafer in the second chamber which are both heated by the lamp means are measured by the pyrometer means, and, when product wafers are annealed, intensity of light of the lamp is compensated based on a difference between the temperatures.

Affiliated with

Also associated with

Rating

Lamp annealer and method for annealing semiconductor wafer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lamp annealer and method for annealing semiconductor wafer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lamp annealer and method for annealing semiconductor wafer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1075515