Laminate material and its use as heat-sink

Details Laminate material and its use as heat-sink Laminate material and its use as heat-sink

1992-03-27

1993-12-21

Turner, A. A.

Stock material or miscellaneous articles

Self-sustaining carbon mass or layer with impregnant or...

174258, 428446, 428698, 428699, 428901, B32B 904

Patent

active

052720098

ABSTRACT:
The laminate material comprises a sintered silicon carbide substrate (S) on which there is deposited by CVD a diamond layer in an enclosure (1) fed with 1% methane in hydrogen through a conduit (13), this gas mixture being activated by a hot tantalum filament raised to 2000.degree. C. This layer is thereafter covered, in another enclosure, with an AlN layer formed from a mixture of H.sub.2 +2% AlCl.sub.3 reacting with a mixture of H.sub.2 +1% NH.sub.3.

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Badziar et al., "Crystallization of Diamond Crystals and Films by Microwave Assisted CVD (Part II)", Mat. Res. Bull., vol. 23, pp. 531-548, 1988.
Chemical Abstracts, vol. 107, No. 10, Sep. 1987, (Columbus, Ohio, U.S.), see p. 306, Abstract 82715b.
Japanese Abstract A-60057993.

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