Laminar flow system for drying parts

Drying and gas or vapor contact with solids – Apparatus – With means to treat gas or vapor

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34 80, 34 82, 219400, 219347, F26B 2106

Patent

active

050482017

ABSTRACT:
A system for drying microelectronic, optical and other parts that in the course of their processing are rendered wet with solvents or other liquids, which if not fully evaporated from the parts will contaminate and impair their quality. The system includes an open-ended drying chamber having a work zone intermediate its sides in which the parts to be dried are supported for exposure to a gas stream. One end of the chamber defines a gas inlet to admit the gas stream which sweeps the entire chamber. Coupled to the drying chamber is a pressure chamber in which a submicron particle filter unit of the Hepa type producing a relatively low pressure drop is disposed to cover the gas inlet. Gas fed into the pressure chamber and heated to an elevated temperature imposes a distributed pressure on the entry face of the filter unit and passes therethrough to yield at its exit face a laminar stream of hot gas that subjects the parts in the work zone to a substantially uniform drying action, so that all parts being treated are fully dried.

REFERENCES:
patent: 3538615 (1970-11-01), Fuhring et al.
patent: 3650040 (1972-03-01), Statham et al.
patent: 3652825 (1972-03-01), Layton
patent: 3875683 (1975-04-01), Waters
patent: 4656757 (1987-04-01), Oschmann

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