Laminar flow system for drying critical parts

Drying and gas or vapor contact with solids – Apparatus – With means to treat gas or vapor

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34 80, 34 82, 219400, F26B 2106

Patent

active

058990011

ABSTRACT:
A system adapted to dry microelectronic, optical or other critical parts which in the course of their processing are rendered wet and become contaminated unless fully dried. The system includes an upright drying chamber having an inlet at its lower end and an outlet at its upper end, the parts to be dried being supported in a work zone between the inlet and outlet. Coupled to the inlet of the drying chamber is an input chamber having a blower therein which blows heated gas into the drying chamber through a filter unit covering the inlet thereto The blower creates a negative pressure in the input chamber and a positive pressure in the drying chamber in which the filtered heated gas acts to evaporate moisture from the parts in the work zone. Surrounding the drying chamber and communicating with the input chamber is an annular duct which due to the negative pressure in the input chamber draws heated moist gas from the outlet of the drying chamber into the input chamber for recirculation in the drying chamber in a toroidal flow patterns Because the heated gas flowing through the annular duct envelopes the drying chamber, it acts to maintain this chamber at a uniform operating temperature to promote uniform drying of the parts.

REFERENCES:
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patent: 3652825 (1972-03-01), Layton
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patent: 4493333 (1985-01-01), Layton
patent: 4656757 (1987-04-01), Oschmann
patent: 5048201 (1991-09-01), Layton
patent: 5105557 (1992-04-01), Vadasz et al.
patent: 5238477 (1993-08-01), Layton

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