Electric lamp or space discharge component or device manufacturi – Process – Including use of electric arc or current for removing an...
Reexamination Certificate
2005-09-20
2005-09-20
Santiago, Mariceli (Department: 2879)
Electric lamp or space discharge component or device manufacturi
Process
Including use of electric arc or current for removing an...
C445S006000, C445S059000
Reexamination Certificate
active
06945838
ABSTRACT:
A knocking treatment method in a flat-type display device in which a first substrate provided with a first electrode and a second substrate provided with a second electrode are disposed with a vacuum space interposed between the first and second substrates and the first substrate and the second substrate are bonded to each other in their circumferential portions, the method comprising applying to the first electrode a pulse voltage V1higher than a voltage to be applied to the second electrode to remove a projection present in the first electrode by field evaporation.
REFERENCES:
patent: 5209687 (1993-05-01), Konishi
patent: 5578900 (1996-11-01), Peng et al.
patent: 6380700 (2002-04-01), Okada
patent: 60-74236 (1985-04-01), None
patent: 7-105850 (1985-04-01), None
patent: 04-249827 (1992-09-01), None
patent: 2000-251737 (2000-09-01), None
patent: 2000-285796 (2000-10-01), None
patent: 2000-294140 (2000-10-01), None
patent: 2000-311590 (2000-11-01), None
International Search Report.
Australian Search Report and Written Opinion dated Mar. 10, 2004.
Iida Koichi
Konishi Morikazu
Kananen Ronald P.
Rader & Fishman & Grauer, PLLC
Santiago Mariceli
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