Keyed end effector for CMP pad conditioner

Details Keyed end effector for CMP pad conditioner Keyed end effector for CMP pad conditioner

1995-06-07

1997-09-16

Smith, James G.

Abrading

Machine

Rotary tool

451443, 451 56, 451494, 451508, B24B 500

Patent

active

056674333

ABSTRACT:
A polishing pad conditioner has a grid with an abrasive surface for conditioning a polishing pad. Opposite the abrasive side of the grid, there is a back surface, having at least one key way, which extends at least partially into the back surface. A grid holder has a number of keys equal to the number of key ways in the back surface of the grid. The grid holder keys engage the grid key ways, thereby eliminating slippage between the grid and the grid holder. A mechanized arm is attached to the grid holder, and imparts a rotational and translational motion to the grid holder. A magnet may be used as an attachment means between the grid and the grid holder. The key ways of the grid and the keys of the grid holder may be arranged such that the grid holder can only receive the grid with the back surface of the grid facing the grid holder.

REFERENCES:
patent: 1380370 (1921-06-01), Fjellman
patent: 2099179 (1937-11-01), Stainbrook
patent: 2541912 (1951-02-01), Broughton
patent: 2662519 (1953-12-01), Metzger
patent: 3623276 (1971-11-01), Twigg
patent: 5472371 (1995-12-01), Yamakura et al.
patent: 5486131 (1996-01-01), Cesna et al.

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