Junction field effect transistor with lateral gate voltage swing

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Junction field effect transistor

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257 77, 257272, 257280, 257282, H01L 2980, H01L 31112, H01L 310312

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active

053090071

ABSTRACT:
A field effect transistor having a buried gate, and one or more gates disposed along the channel between the source and drain, which cooperate to cause the electric field within the channel along its length to be more uniform, and have a lower field maximum. The geometry and/or doping of the channel can be varied to selectively vary the channel resistivity along its length, which also makes the field more uniform. Because of the more uniform field, electrons are exposed to a higher field strength nearer the source, and are accelerated to higher velocities more quickly, reducing the response time and increasing the frequency range of the transistor. Because the peak field is reduced, the transistor can carry more power without reaching breakdown potential within the channel.

REFERENCES:
patent: 4800172 (1989-01-01), Okano et al.
patent: 4914743 (1990-04-01), Yoder et al.
patent: 4929986 (1990-05-01), Yoder
patent: 5012315 (1991-04-01), Shur
patent: 5079620 (1992-01-01), Shur
IEEE Transactions on Electron Devices, vol. 36, No. 6, Jun. 1989, "High-Tsconductance B-SiC Buried-Gate JFET's" by Kelner et al., pp. 1045-1049.
IEEE Electron Device Letters, vol. EDL-8, No. 9, Sep. 1987, "B-SiC MESFET's and Buried-Gate JFET's" by Kelner et al., pp. 428-430.

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