Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Junction field effect transistor
Reexamination Certificate
2007-02-12
2009-02-17
Lee, Eugene (Department: 2891)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Junction field effect transistor
C257S134000, C257S272000, C257S256000, C257S504000, C257SE29057, C257SE29059
Reexamination Certificate
active
07491987
ABSTRACT:
Example embodiments are directed to a junction field effect thin film transistor (JFETFT) including a first electrode formed on a substrate, a first conductive first gate semiconductor pattern formed on the first gate electrode, a second conductive semiconductor channel layer formed on the substrate and the first conductive first gate semiconductor pattern, and source and drain electrodes formed on the second conductive semiconductor pattern and located at both sides of the first conductive gate semiconductor pattern. The JFETFT may further include a first conductive second gate semiconductor pattern formed on a portion of the second conductive semiconductor channel layer between the source electrode and the drain electrode, and a second gate electrode formed on the first conductive second gate semiconductor pattern.
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Caputo et al., Low Pinch-Off Voltage Amorphous Silicon Junction Field-Effect transistor: Experiment and Simulation, IEEE Trans. Elcn. Device, vol. 50, No. 6, p. 1559-1561, Jun. 2003.
Cho Choong-Rae
Genrikh Stefanovich
Lee Eun-Hong
Gumedzoe Peniel M
Harness Dickey & Pierce PLC
Lee Eugene
Samsung Electronics Co,. Ltd
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