Jetspray nozzle and method for cleaning photo masks and...

Fluid sprinkling – spraying – and diffusing – Including supply holder for material – To be mixed – dissolved or entrained in a flowing liquid...

Reexamination Certificate

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Details

C239S313000, C239S368000, C239S369000, C239S370000, C239S371000, C134S902000

Reexamination Certificate

active

08056832

ABSTRACT:
A jetspray nozzle for cleaning a photolithographic mask or semiconductor wafer and method for cleaning the same. The jetspray nozzle in one embodiment includes a water supply inlet, a gas supply inlet, a first row of gas injection nozzles communicating with the gas supply inlet, a mixing cavity defining a jetspray nozzle outlet, and a flow mixing baffle disposed in the cavity. The mixing baffle preferably is configured and arranged to combine gas and water in the jetspray nozzle for delivering a concentrated stream of gas with a cluster of micro water droplets entrained in the gas for removing contaminant particles from the mask. The jetspray nozzle is capable of cleaning photo masks or wafers without the use of chemicals. In one embodiment, the water may be deionized water and the gas may be nitrogen. In another embodiment, the jetspray nozzle further includes a second row of gas injection nozzles spaced above or below the first row of gas injection nozzles that communicate with the gas supply inlet.

REFERENCES:
patent: 5129583 (1992-07-01), Bailey et al.
patent: 5678766 (1997-10-01), Peck et al.
patent: 5934566 (1999-08-01), Kanno et al.
patent: 5992529 (1999-11-01), Williams
patent: 6293294 (2001-09-01), Loeb et al.
patent: 6841311 (2005-01-01), Chen
patent: 2009/0178812 (2009-07-01), Solomon et al.
patent: 1484282 (2004-03-01), None
Steve Osborne et al., “Mask Cleaning Strategies—Particle Elimination with Minimal Surface Damage,” 25th Annual BACUS Symposium on Photomask Technology, Nov. 8, 2005, 10 pages.

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