Jet vapor deposition of organic molecule guest-inorganic host th

Details Jet vapor deposition of organic molecule guest-inorganic host th Jet vapor deposition of organic molecule guest-inorganic host th

1995-11-15

1998-02-24

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, C23G 1400

Patent

active

057208212

ABSTRACT:
A host-guest jet vapor deposition system uses sonic jets and moving substrates to produce host-guest films in which complex organic molecules are trapped in hard, inorganic hosts. The system is capable of film fabrication at high rate and room temperature. Guest molecule concentrations are large and film quality is excellent. Films made in accordance with the present invention have applications in optics and electronics.

REFERENCES:
patent: 4788082 (1988-11-01), Schmitt
patent: 5256205 (1993-10-01), Schmitt
U.S. application No. 07/521,100, Schmitt et al., filed May 9, 1990. Microwave Plasma Assisted Gas Jet Deposition of Thin Film Material.
"Handbook of Deposition Technologies for Films and Coatings", by Rointan F. Bunshah, et al, Noyes Publishing Company, Park Ridge, New Jersey, 1st edition, 1982, 2nd edition, 1994.
U.S. Application No. 07/670,693, Schmitt et al., filed Mar. 18, 1991. An Evaporation System for Gas Jet Deposition of Thin Film Materials.
S. Hayashi, M. Fujii, and K. Yamamoto, "Quantum size effects in Ge microcrystals embedded in SiO.sub.2 thin films" Jap. J. of Appl. Phys. Part 2, 28, L1464 (1989).
R.P. Andres, et al., "Research Opportunities on Cluster and Cluster Assembled Materials-a Department of Energy, Council of Materials Science Panel Report", J. Mater. Res. 4, 704 (1989) C. Laurent and E. Kay, J. Appl. Phys. 65 1717 (1989).

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