Jet vapor deposition of nanocluster embedded thin films

Details Jet vapor deposition of nanocluster embedded thin films Jet vapor deposition of nanocluster embedded thin films

1994-03-11

1998-06-02

Bueker, Richard

Coating processes

Spray coating utilizing flame or plasma heat

C23C 1600

Patent

active

057596344

ABSTRACT:
An "arrested nucleation" jet vapor deposition system uses sonic jets and moving substrates to produce nanocluster-embedded films in which semiconductor or metal nanoclusters are trapped in a film of hard, inorganic host materials. CdSe films fabricated at high rate and room temperature in accordance with the present invention show unusual nonlinear optical behavior. Nanoclusters have unique size dependent properties and nanocluster based films have applications in optics and electronics.

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