Jet-cleaning device for developing station

Details Jet-cleaning device for developing station Jet-cleaning device for developing station

1998-04-22

2000-06-06

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

134902, B08B 302

Patent

active

060706015

ABSTRACT:
A jet-cleaning device for a developing station, especially suitable for installing on a wafer back cleaning ring of a CLEAN TRACK MK-V developing station. The jet-cleaning device is used for cleaning the wafer back of a wafer mounted above a spinner. The jet-cleaning, device comprises a jet-cleaning block and a vertical nozzle. The jet-cleaning block has a nozzle groove having an inlet for pumping in a cleaning solution. The vertical nozzle is connected to the nozzle groove for forming a vertical jet of the cleaning solution so that waste liquid on a wafer back can be removed.

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