Radiant energy – Ion generation – Field ionization type
Patent
1997-05-23
1999-11-09
Anderson, Bruce C.
Radiant energy
Ion generation
Field ionization type
250423P, 31511181, H01J 3708
Patent
active
059819553
ABSTRACT:
A plasma chamber for use in isotope enrichment has a microwave feed to the ECRH microwave horns, which feed is led into the plasma chamber behind the sputter plate and perpendicular to the magnetic field for improved microwave waveguide routing and ease of microwave window handling and maintenance. Improved collector design includes a collector assembly placed behind the plasma source comprising a dump plate and flat and shield collector. A ring collector is provided outside the main plasma region in the case where two opposing magnetic mirrors are used and the resonant ions maintained between them. An improved collector assembly can also be provided by disposing the collector assembly in front of the plasma source region and having a double shield-and-slat collector for capturing high energy resonant ions or permitting passage of low energy ions therethrough. Sputter sources for nonconducting materials can be provided by using a thin surface coating applied to a metal backing. The surface coat has a thickness of approximately one ion implantation depth so that the backing plate bleeds the charge from the surface coat. The thin surface coat may continually be replenished within directed jet vapor from a plasma or a doped or filled conductive plasma sputter plate may be employed.
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Rosenthal Glenn B.
Wong Alfred Y.
Anderson Bruce C.
Dawes Daniel L.
The Regents of the University of California
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