Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy
Patent
1975-08-27
1979-11-27
Nozick, Bernard
Chemistry: electrical and wave energy
Processes and products
Processes of treating materials by wave energy
204DIG11, 250423P, 250527, 55 2, 55102, 55151, 55138, B01J 110
Patent
active
041760255
ABSTRACT:
A method for separating isotopes in which a selected isotope of a given molecule is first excited to enhance preferential dissociative electron attachment, which facilitates the separation of the desired isotope from its natural mixture. Molecules incorporating the particular isotope of interest are selectively excited to the proper vibrational and/or electronic state by narrow line radiation to enhance preferential dissociative electron attachment. The excited molecules are then exposed to low energy electrons which dissociatively attach to the excited molecules forming stable negative ion fragments. The negative ion or neutral fragments containing the desired isotopes are then separated from the remaining mixture resulting in an enrichment of the desired isotope.
REFERENCES:
patent: 3443087 (1969-05-01), Robieux et al.
patent: 3772519 (1973-11-01), Levy et al.
patent: 3937956 (1976-02-01), Lyon et al.
patent: 3939354 (1976-02-01), Janes
patent: 4000051 (1976-12-01), Kaldor
patent: 4000420 (1976-12-01), Harris
Hodgson et al., Isotope Separation using Laser Light, IBM, Bulletin Technical Disclosure, vol. 17, No. 11, 4/75, 2 pages._
Chantry Peter J.
Chen Cheng-Lin
Abeles D. C.
Dermer Z. L.
Nozick Bernard
Westinghouse Electric Corp.
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