Isoparaffin/olefin alkylation over vacancy-containing titanometa

Chemistry of hydrocarbon compounds – Saturated compound synthesis – By condensation of a paraffin molecule with an olefin-acting...

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585721, 585722, 585732, C07C 258

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active

054988179

ABSTRACT:
The invention provides a process for alkylating an olefin with an isoparaffin comprising contacting an olefin-containing feed in the presence of a thermally stable composition comprising a non-swellable layered chalcogenide of an element having an atomic number of 4, 5, 12 to 15, 20 to 33, 38 to 51, 56 to 83 and greater than 90, inclusive, said layered metal chalcogenide comprising an interspathic polymeric chalcogenide of an element selected from Groups IB, IIB, IIIA, IIIB, IVA, IVB, VA, VB, VIA, VIIA, and VIIIA of the Periodic Table.

REFERENCES:
patent: 3236671 (1966-02-01), Dybalski et al.
patent: 3644565 (1972-02-01), Biale
patent: 3647916 (1972-03-01), Caesar et al.
patent: 3655813 (1972-04-01), Kirsch et al.
patent: 3738977 (1973-06-01), Biale
patent: 3917738 (1975-11-01), Fenske et al.
patent: 4176090 (1979-11-01), Vaughan et al.
patent: 4384161 (1983-05-01), Huang
patent: 4831005 (1989-05-01), Aufdembrink
patent: 4831006 (1989-05-01), Aufdembrink
patent: 5155076 (1992-10-01), Moini
patent: 5256617 (1993-10-01), Moini
patent: 5304698 (1994-04-01), Husain
patent: 5371309 (1994-12-01), Moini

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