Isolation structure for semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Including dielectric isolation means

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257519, 257520, 257374, H01L 2900

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active

055414400

ABSTRACT:
It is an object of the present invention to provide a semiconductor device which has a high electrical isolation capability and an enhanced electrical reliability for avoiding short circuit of individual conductive layers, and the present invention also provides a method of manufacturing such a semiconductor device. An n.sup.+ buried layer and an n.sup.- epitaxial growth layer are formed on a p.sup.- silicon substrate. An element isolation oxide film having a through hole is formed on the surface of n.sup.- epitaxial growth layer. A trench which penetrates through n.sup.- epitaxial growth layer and n.sup.+ buried layer to reach a predetermined depth of p.sup.- silicon substrate is formed under through hole. A first insulating layer covers the internal wall of trench. A covering layer covers the sidewall of through hole. A filling layer is formed to fill trench so that the top surface thereof is located within through hole. A second insulating layer is formed on filling layer.

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patent: 4789885 (1988-12-01), Brighton et al.
patent: 5306940 (1994-04-01), Yamazaki
patent: 5457339 (1995-10-01), Komori et al.

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