Isolation regions formed by locos followed with groove etch and

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 47, 437 67, 437 69, H01L 2176, H01L 2195

Patent

active

047469633

ABSTRACT:
A semiconductor device employing a new isolation process is disclosed, wherein an isolation area is a region in which a burying material is buried in a deep groove formed in a semiconductor body with a substantially constant width by anisotropic dry etching, semiconductor elements are formed in selected ones of semiconductor regions isolated by the isolation area, and others of the semiconductor regions, with no semiconductor element formed therein, have their whole surface covered with a thick oxide film which is produced by the local oxidation of the semiconductor body. The new isolation process is well-suited for a bipolar type semiconductor device, wherein the deep groove is formed so as to reach a semiconductor substrate through an N.sup.+ -type buried layer, and a thick oxide film formed simultaneously with the aforementioned thick oxide film isolates the base region and collector contact region of a bipolar transistor.

REFERENCES:
patent: 4412237 (1983-10-01), Matumura et al.
patent: 4566940 (1986-01-01), Itsumi et al.
patent: 4611386 (1986-09-01), Goto
Appels et al., Philips Res. Repts. 25, 118-132, 1970.
Antipov, IBM Tech. Disc. Bull., vol. 23, No. 11, Apr. 1981, pp. 4917-4919.
Tang et al., IEEE International Solid State Circuits Conf., vol. 25, Feb. 1982, pp. 242-243.
Tamaki et al., Japanese Journal of Applied Physics Supplement, vol. 21, No. 1, (1982), pp. 37-40.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Isolation regions formed by locos followed with groove etch and does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Isolation regions formed by locos followed with groove etch and , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Isolation regions formed by locos followed with groove etch and will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1061487

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.