Isolation of novolak resin by low temperature sub surface forced

Details Isolation of novolak resin by low temperature sub surface forced Isolation of novolak resin by low temperature sub surface forced

1994-12-30

1998-05-12

Truong, Duc

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From phenol, phenol ether, or inorganic phenolate

528137, 528230, 528501, 528503, 430192, 430193, 430270, C08G 804, C08G 1404

Patent

active

057506329

ABSTRACT:
A water insoluble, aqueous alkali soluble novolak resin, process for producing such a novolak resin, a photoresist containing such a novolak resin, and a method for producing a semiconductor device, wherein the resin is isolated by sub surface forced steam distillation.

REFERENCES:
patent: 5403696 (1995-04-01), Hioki et al.
patent: 5407780 (1995-04-01), Hioki et al.

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