Patent
1974-11-01
1976-11-30
Wojciechowicz, Edward J.
357 47, 357 60, 357 88, 357 89, 357 90, H01L 2702, H01L 2704, H01L 2904
Patent
active
039953092
ABSTRACT:
Isolation junctions in semiconductor devices are formed by selected regions of specified conductivity wherein each region has a substantially uniform thickness and resistivity throughout the region. The material of the selected regions is recrystallized semiconductor material with solid solubility of the dopant impurity.
REFERENCES:
patent: 2813048 (1957-11-01), Pfann
patent: 3617399 (1971-11-01), Fowler
patent: 3624467 (1971-11-01), Bean
patent: 3656028 (1972-04-01), Langdon
patent: 3769105 (1973-10-01), Chen
Cohen Joseph T.
General Electric Company
Squillaro Jerome C.
Winegar Donald M.
Wojciechowicz Edward J.
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