Isolation junctions for semiconductor devices

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Details

357 47, 357 60, 357 88, 357 89, 357 90, H01L 2702, H01L 2704, H01L 2904

Patent

active

039953092

ABSTRACT:
Isolation junctions in semiconductor devices are formed by selected regions of specified conductivity wherein each region has a substantially uniform thickness and resistivity throughout the region. The material of the selected regions is recrystallized semiconductor material with solid solubility of the dopant impurity.

REFERENCES:
patent: 2813048 (1957-11-01), Pfann
patent: 3617399 (1971-11-01), Fowler
patent: 3624467 (1971-11-01), Bean
patent: 3656028 (1972-04-01), Langdon
patent: 3769105 (1973-10-01), Chen

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